Aluminum Sulfide Sputtering Target,CAS : 1302-81-4

E FORU specializes in producing high purity Aluminum Sulfide Sputtering Target,CAS : 1302-81-4 with the smallest possible average grain sizes,Purities may include 99%, 99.9%, 99.99%, 99.999% and 99.9999%, which are sometimes referred to as 2N, 3N, 4N, 5N and 6N. 99.99995% (6N5), and in some cases up to 99.99999% (7N) and 99.999999% (8N),Our standard powder particle sizes average in the range of - 325 mesh, - 200 mesh,- 100 mesh, 10-50 microns and submicron ( 1 micron). We can also provide in the nanoscale range.Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas.Production of metallic carbide materials including boron Sulfide, cobalt Sulfide, chromium Sulfide, hafnium Sulfide, molybdenum Sulfide, niobium Sulfide, tantalum Sulfide, titanium Sulfide, vanadium Sulfide, zirconium Sulfide, and numerous others.Sulfides are compounds derived from the sulfide anion, S2-. As sulfur is a member of group 22 on the periodic table, it is considered a chalcogen, and sulfide compounds belong to a class of compounds known as chalcogenides.Alkali metal and alkaline earth chalcogenides, including the sulfides, have bonds with more ionic character than those found in transition metal sulfides. They are typically colorless, water-soluble compounds, and are used more as chemical reagents than as functional materials..Quality inspection department staff which uses atomic spectroscopy, x-ray diffraction analysis, scanning electron microscopy, glow discharge mass spectroscopy (GDMS), and BET surface area analysis, among other technologies, to ensure that the elemental composition and structural properties of each product rigorously adhere to our standards.